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    • 专利摘要:
    In one aspect, the present disclosure is directed to an infrared multispectral imaging device (20) adapted for detection at at least a first and a second detection wavelength. It comprises a detection matrix (23) comprising a set of elementary detectors (23i) of predetermined dimensions forming an image field of given dimensions; and an image forming optic (22) having a given aperture number (N) and focal length (F), adapted for the formation at any point of the image field of an elementary focusing spot covering a set of apertures. at least two elementary detectors juxtaposed. The device further comprises a matrix (24) of metallo-dielectric guided mode resonant elementary filters arranged in front of the detection array (23) at a distance less than a focus depth of the optics (22), the dimensions elementary filters being adapted so that each elementary focusing spot formed at each point of the image field covers at least two elementary filters; and the elementary filters are optimized for bandpass transmission in spectral bands centered on two different central wavelengths, equal to two of said detection wavelengths.
    公开号:FR3065132A1
    申请号:FR1753017
    申请日:2017-04-06
    公开日:2018-10-12
    发明作者:Antoine Bierret；Gregory Vincent；Riad Haidar；Fabrice Pardo；Jean-Luc Pelouard
    申请人:Office National dEtudes et de Recherches Aerospatiales ONERA；Centre National de la Recherche Scientifique CNRS；
    IPC主号:
    专利说明:

    Holder (s): NATIONAL OFFICE FOR AEROSPATIAL STUDIES AND RESEARCH (ONERA) Public establishment, NATIONAL CENTER FOR SCIENTIFIC RESEARCH - CNRS.
    Extension request (s)
    Agent (s): MARKS & CLERK FRANCE General partnership.
    (04) DEVICE AND METHOD FOR MULTISPECTRAL IMAGING IN THE INFRARED.
    FR 3 065 132 - A1 f5j> According to one aspect, the present description relates to a device (20) for multispectral imaging in the infrared suitable for detection at at least a first and a second detection wavelength. It comprises a detection matrix (23) comprising a set of elementary detectors (23i) of predetermined dimensions forming an image field of given dimensions; and an image forming optic (22) having a given aperture number (N) and a focal distance (F), suitable for the formation at any point of the image field of an elementary focusing spot covering a set of '' at least two elementary detectors juxtaposed. The device further comprises a matrix (24) of elementary metallo-dielectric guided mode resonance filters, arranged in front of the detection matrix (23) at a distance less than a focal depth of the optics (22), the dimensions elementary filters being adapted such that each elementary focusing spot formed at each point of the image field covers at least two elementary filters; and the elementary filters are optimized for band pass transmission in spectral bands centered on two different central wavelengths, equal to two of said detection wavelengths.

    i
    Infrared multispectral imaging device and method
    STATE OF THE ART
    Technical area
    The present invention relates to a device and method for multispectral infrared imaging.
    State of the art
    In the visible or near infrared, various means are known for forming color images by means of digital cameras of the CCD or CMOS type. It is possible for example to use spectral separation means to form on several detectors images respectively in different spectral bands. It is also known to place a filter wheel in front of the camera and to sequentially acquire a series of images in different spectral bands. In each of these cases, the color image is reconstructed from the different images acquired in the different spectral bands. The most widely used technique is however the structuring of the focal plane to form a mosaic of pixelated filters, for example in the form of a so-called “Bayer structuring” (described in US Pat. No. 3,971,065) which makes it possible to acquire simultaneously and with a single detector of images in different spectral bands in order to reproduce the vision of the human eye as closely as possible. To do this, red, green and blue filters are positioned at the level of each of the elementary detectors of the camera (or "pixels") in the form of a mosaic of 4 pixelated filters (one red, 2 green, one blue), this pattern being reproduced over the entire surface of the detector. A “demosaicking” algorithm then makes it possible to reconstruct the color image. Pixelated filters are generally produced in the near infrared in the form of multilayer structures forming interference filters (see for example M. Lequime et al., "2 / 2-Array Pixelated Optical Interference Filters", Proc. SPIE Vol. 9627, 96270V -1 96270V-7, 2015) and the technology is very well mastered. In the visible, dyes can also be used.
    In infrared, that is to say for wavelengths typically between 3 pm and 20 pm, the need for multispectral imaging also exists, not to reproduce an image similar to that detected by the eye , but to access various information such as for example the identification of a chemical species or an object thanks to its spectral signature, the temperature analysis of an emissive body, the determination of the spectral emissivity of a body, etc.
    The use of multilayer structures for multispectral infrared imaging in the 3-5 pm band has been described, but it has a certain number of limitations (see M. Oussalah et al. ^ Multispectral thin film coating on infrared detector, Proc. SPIE ., Vol. 9627, 96271W-96271W-10, (2015)). In particular, as soon as they involve a large number of layers, these components, if the materials are not chosen with great care, can present a brittleness as soon as they are subjected to temperature variations. Furthermore, in the infrared, the thicknesses of the layers are large (typically greater than 1 μm) and variable from one filter to another. This not only causes technological difficulties but can result in a deterioration in performance in terms of spectral selectivity due to parasitic diffraction effects (edge effects) resulting in particular from differences in thickness of filter to filter.
    Other techniques have been developed for multispectral infrared imaging, no longer based on a stack of layers but on periodic sub-wavelength structures of metal layers, in particular making it possible to work with a limited number of layers.
    Thus, Haïdar et al. (fFree-standing subwavelength metallic gratings for snapshot multispectral imaging, Appl. Phys. Lett. 96, 221104, (2010)) describes a multispectral infrared camera based on the use of suspended subwavelength metallic networks. These structures exhibit remarkable transmissions at wavelengths which depend on the period. By juxtaposing several filters of different periods, it is thus possible to produce a camera with several imaging optical channels, each channel further comprising a spectral filter, which makes it possible to form for each channel an image on a given surface, typically a millimeter surface. , in a given spectral band.
    FIG. 1 thus illustrates a multi-channel infrared camera 10 according to the prior art. The camera comprises a set of lenses, or microlenses, arranged for example in an enclosure 11. These lenses, referenced 12a, 12b, 12c, 12d in FIG. 1, are suitable for forming images on a detection matrix 13 formed of elementary detectors (or "pixels") 13i. Upstream of each of the lenses 12i, for example at the level of an inlet window of the enclosure 11, there is a matrix of filters 14 adapted for filtering in transmission in spectral bands centered on wavelengths of data detection. By choosing for each of the filters referenced 14a, 14b, 14c, 14d in FIG. 1 of the transmission spectral bands centered on different detection wavelengths, on the matrix of elementary detectors 13, 4 images of different "colors" are formed on detection surfaces typically of millimeter dimensions. A read circuit 15 is suitable for processing the signals detected for each of the images and transmitting the signals to a calculation unit (not shown). This is called a "multi-channel" camera.
    In Sakat et al. 2011 (“Guided mode resonance in subwavelength metallodielectric free-standing grating for bandpass filtering”, Opt. Lett.36, 3054 (2011)) and Sakat et al. 2013 (“Metal-dielectric bi-atomic structure for angular-tolerant spectral filtering”, Opt. Lett., 38, 425, (2013)) are described guided mode resonance filters (or “GMR” according to the abbreviation of the expression “Guided Resonance Mode”) metallo-dielectrics. These filters are based on a mode resonance guided in a thin dielectric layer, the coupling of which with free space is ensured by a metallic network, in particular for orders ± 1 diffracted in the dielectric. Compared to the structures described in Haïdar et al., These filters may have better angular tolerance (see Sakat et al. 2013) which, when installed in a multi-channel camera configuration as illustrated in FIG. 1, to work with larger fields while keeping the spectral performance of the filters.
    However, in filters based on periodic subwavelength structures as described above, only the response of GMR filters in plane waves has been considered, possibly depending on the angle of incidence of this wave, for use. on large surfaces (typically millimeter surfaces), as in the multi-channel camera described in FIG. 1.
    For the first time, it is demonstrated in the present application the feasibility of a multispectral infrared imaging device with metallodielectric GMR filters operating on surfaces of the size of the detection pixel, opening the way to new imagers compact for instant acquisition of "color" infrared images.
    ABSTRACT
    According to a first aspect, the present description relates to a multispectral infrared imaging device suitable for detection at at least a first and a second detection wavelength comprising:
    a detection matrix comprising a set of elementary detectors of predetermined dimensions forming an image field of given dimensions;
    an image forming optic having a given number of aperture and focal distance, suitable for the formation at any point of the image field of an elementary focusing spot, said focusing spot covering an assembly of at least two juxtaposed elementary detectors;
    - a matrix of elementary filters with metallo-dielectric guided mode resonance, arranged in front of the detection matrix at a distance less than a focal depth of the imaging optics, the dimensions of the elementary filters being adapted so that each elementary focusing spot formed at each point of the image field covers at least two elementary filters, said elementary filters being optimized for band pass transmission in spectral bands centered on two different central wavelengths, equal to two of said lengths d detection wave.
    An elementary metallo-dielectric guided mode resonance filter, optimized for bandpass transmission in a spectral band centered on a given detection wavelength Xa, comprises, within the meaning of the present description, a layer of dielectric material forming a mono mode waveguide at said detection wavelength Xa, and at least one metal diffractive grating, structured according to a given pattern repeated with a given period, less than said detection wavelength. At least one diffraction grating is suitable for coupling an incident wave to said detection wavelength Xa in the waveguide mode.
    According to one or more exemplary embodiments, a pattern for structuring the diffractive grating comprises one or more openings, of predetermined dimensions, the openings being filled with a dielectric material which may be ambient air or another dielectric material such as for example the material dielectric forming the waveguide or that forming a substrate. The openings may have shapes of one-dimensional slots of given widths, of slots of given widths arranged in two perpendicular directions, shapes of crosses, or may be circular openings, etc. Depending on the geometry of the opening, the elementary filter can be selective in polarization or not.
    The applicants have demonstrated remarkable unexpected properties of the behavior of elementary metallo-dielectric guided mode resonance filters when they are illuminated in a convergent beam over dimensions of a few periods, making possible the use of “pixelated” elementary filters, c that is to say whose dimensions are of the order of magnitude of those of each elementary detector, or "pixel".
    The shape and dimensions of the focusing spot at a given point in the field as well as the depth of focus (or depth of image field) result in a known manner from the opto-geometric characteristics of the imaging optics and from the wave length. For the estimation of the dimensions of the focusing spot and the depth of focus, a predetermined wavelength value can be taken, for example the wavelength λ ,,, ιη corresponding to the minimum wavelength that we are trying to detect with the multispectral infrared imaging device.
    For example, for an image forming optical system with symmetry of revolution, it is possible to take as dimension of the diameter of the focusing spot, the diameter φ given by the diffraction limit at a given wavelength λ, for example the minimum detection wavelength.
    According to one or more exemplary embodiments, at least one of said elementary filters has an angular acceptance greater than or equal to a predetermined value, a function of the opto-geometrical parameters of the device, for example the optogeometric parameters of the imaging optics and / or the detection matrix.
    The angular acceptance ΔΘ of an elementary filter is defined in the present description by the angle of incidence of a plane wave incident on the filter with a given inclination, measured with respect to a direction normal to the filter, and for which the maximum transmission is equal to half the maximum transmission of an identical plane wave incident on the filter with a zero angle of incidence (normal incidence).
    According to one or more exemplary embodiments, said predetermined value is the field edge angle of the device, defined as the angle of the most inclined ray intended to reach the array of elementary detectors relative to the direction normal to said array of elementary detectors. It depends on the size of the array of elementary detectors, the number of apertures and the focal length of the imaging optics.
    According to one or more exemplary embodiments, each of said elementary filters of the elementary filter matrix has an angular acceptance greater than or equal to the field edge angle of the device. Indeed, even if the angular acceptance required for an elementary filter is weaker in the center of the image field, one can choose to optimize all the elementary filters of the matrix of elementary filters to obtain the greatest angular acceptance, c 'is to say that required for an elementary filter positioned at the edge of the image field.
    According to one or more exemplary embodiments, each of said elementary filters has dimensions which are substantially identical to those of an elementary detector. In practice, as recalled above, an elementary metallodielectric guided mode resonance filter comprises a waveguide of dielectric material and at least one metallic network structured according to a given pattern, repeated with a given period. The dimension of an elementary filter is therefore multiple of the dimension of a pattern and can be a little larger or a little smaller than an elementary detector. Thus, by substantially identical dimensions, it is understood that the difference between a dimension of an elementary filter and that of an elementary detector (“pixel”) is less than the central wavelength of the spectral transmission band of the filter. . It is however possible that an elementary filter has a dimension equal to several times that of a pixel, for example between 2 and 4 times.
    According to one or more exemplary embodiments, the elementary filters of the elementary filter matrix are arranged in the form of zones, each zone comprising at least two elementary filters optimized for band pass transmission in spectral bands centered on two central wavelengths different, and each zone having dimensions greater than those of the focusing spot. According to one or more exemplary embodiments, the arrangement of the elementary filters is identical in each zone.
    According to one or more exemplary embodiments, the elementary filter matrix comprises at least one elementary guided mode resonance filter of DMG type (abbreviation of the English expression “Dual metallic Grating”), optimized for bandpass transmission in a spectral band centered on a given detection wavelength Xa, comprising a layer of dielectric material forming a single-mode waveguide at said detection wavelength Xa, and two metal diffractive gratings arranged on either side of the layer of dielectric material. Each metallic network is structured according to a given pattern repeated with a given period, less than the detection wavelength and is suitable for coupling an incident wave to said wavelength of detection wavelength Xa at waveguide mode. Advantageously, the periods are identical for the two networks.
    According to one or more exemplary embodiments, the elementary DMG type guided mode resonance filter is suspended and the two metal networks of the elementary filter are identical (same metal, same pattern, same period).
    According to one or more exemplary embodiments, the elementary DMG type guided mode resonance filter is deposited on a substrate made of dielectric material and the patterns of the two metal networks of the elementary filter are different, to take account of the differences in refractive index. dielectric materials on either side of the waveguide (air and substrate for example). Advantageously, the periods remain identical for the two networks.
    According to one or more exemplary embodiments, the elementary filter matrix comprises at least one elementary guided mode resonance filter of “bi atom” type, in which at least one metallic network has a pattern with at least two openings with different dimensions , for example two slots of different widths.
    According to one or more exemplary embodiments, the elementary filter matrix comprises at least one elementary guided mode resonance filter with single metallization on the front face, comprising a waveguide made of dielectric material with on one side a substrate and l on the other hand, a double metallic network, the networks having a different pattern and, according to one or more exemplary embodiments, an identical period.
    In each of the examples cited above, all the elementary metallo-dielectric guided mode resonance filters of the elementary filter matrix can be identical or on the contrary, it is possible to have different elementary filters, for example between the edge and the center of the field.
    According to one or more exemplary embodiments, the elementary filters of the elementary filter matrix are arranged on the same substrate, which facilitates their manufacture. They can also be suspended.
    According to a second aspect, the present description relates to a multispectral infrared imaging method suitable for detection at at least a first and a second wavelength comprising:
    the formation of an image of a scene by means of a given aperture image formation optic and the acquisition of said image by means of a detection matrix comprising a set of elementary detectors of predetermined dimensions forming an image field of given dimensions, the imaging optics forming at every point of the image field an elementary focusing spot covering a set of at least two juxtaposed elementary detectors;
    the filtering of light beams focused by said image forming optic by means of a matrix of elementary metallo-dielectric guided mode resonance filters, arranged in front of the detection matrix at a distance less than a focal depth of l image forming optics, so that each elementary focusing spot formed at each point of the image field covers at least two elementary filters, said elementary filters being optimized for band pass transmission in spectral bands centered on two lengths d 'different central wave, equal to two of said detection wavelengths.
    BRIEF DESCRIPTION OF THE DRAWINGS
    Other advantages and characteristics of the invention will appear on reading the description, illustrated by the following figures:
    FIG. 1, already described, a multi-channel infrared camera according to the prior art;
    FIG. 2A, a diagram of a multispectral infrared imaging device according to an example of the present description; FIG. 2B, an example of arrangement of elementary metallo-dielectric guided mode resonance filters in an elementary filter matrix suitable for a multispectral infrared imaging device according to the present description;
    FIG. 3A, an exemplary embodiment of a metallo-dielectric GMR filter of the suspended dual-atom DMG type, suitable for a multispectral infrared imaging device according to the present description; and FIGS 3B, 3C two curves showing simulations of transmission as a function of the wavelength and as a function of the angle of incidence (in plane waves), in the case of an example of suspended DMG filter, bi- atom (FIG. 3 A);
    FIG. 4A, an exemplary embodiment of a metallo-dielectric GMR filter of the DMG bi-atom type on substrate, suitable for a multispectral infrared imaging device according to the present description; and FIGS 4B, 4C two curves showing transmission simulations as a function of the wavelength and as a function of the angle of incidence (in plane waves), in the case of an example of a DMG bi-atom filter on substrate (FIG. 4A);
    FIG. 5A, an exemplary embodiment of a metallo-dielectric GMR filter of the filter type on a substrate with a single metallization on the front face, suitable for a multispectral infrared imaging device according to the present description; and FIGS 5B, 5C two curves showing simulations of transmission as a function of the wavelength and as a function of the angle of incidence (in plane waves), in the case of an example of filter on substrate with metallization facing front (FIG. 5A);
    FIGS. 6A and 6B, the diagram of an exemplary embodiment of a filter matrix suitable for a multispectral infrared imaging device according to the present description, comprising metallo-dielectric GMR filters of the suspended dual-atom DMG type, and a simulation showing the confinement of the field in the filter matrix illuminated in a convergent beam.
    DETAILED DESCRIPTION
    FIG. 2A illustrates an example of a multispectral infrared imaging device according to the present description. Multispectral imaging includes the formation of images at at least two different detection wavelengths, or more precisely in at least two detection spectral bands centered on two different detection wavelengths. The infrared spectral band is defined in the present description as the set of wavelengths between 1 pm and 15 pm.
    The infrared multispectral imaging device, referenced 20 in FIG. 2A, comprises, for example in an enclosure 21, a detection matrix 23 comprising a set of elementary detectors 23i, or "pixels", of predetermined dimensions, a reading circuit 25 for processing the signals delivered by the elementary detectors 23i, a processing unit 26 connected to the reading circuit 25 as well as a matrix 24 of elementary filters 24i with metallo-dielectric guided mode resonance, an example of which is illustrated in FIG. 2B. The infrared multispectral imaging device further comprises an image forming optic 22 arranged in the enclosure or outside the enclosure and suitable for the formation of images in the infrared.
    The detection matrix suitable for infrared can include any type of known matrix detector (ID array or 2D detector), such as, for example, MCT (for Mercury Cadmium Tellurium), InAs, QWIP (AlGAAs / As / GaAs) detectors. , superlattices (InAs / GaSb), these detectors operating in a cooled enclosure 21. Other ίο types of detectors suitable for operation in an uncooled environment can also be used, such as microbolometers.
    Typically, for operation of the multispectral imaging device between lpm and 15pm, it will be possible to work with elementary detectors of dimensions between 15 pm and 30 pm, arranged according to a detection strip (for example in a 288 × 4 pixel format) or according to a two-dimensional matrix (for example in a 640 x 480 pixel format). The dimensions of the detection matrix define those of the image field of the image forming device.
    The imaging lens 22 is characterized by an aperture number N and a focal length F, with N = D / F, where D is the diameter of the pupil of the imaging lens. The imaging lens can include one or a plurality of lenses, formed from transparent materials of interest wavelengths, such as germanium.
    The imaging optic 22 is suitable for forming images of a scene on the detection matrix 23. In practice, as with any optical system, it is possible to define for the imaging optic to a given wavelength a spot of elementary focusing at a point in the image field and a depth of focus.
    The shape and dimensions of the focusing spot at a given point in the field as well as the focal depth (or depth of image field) are determined in known manner, at a given wavelength, by the opto-geometric characteristics of imaging optics.
    For example, for an imaging lens with symmetry of revolution, the diameter of the focusing spot φ can be defined by the diffraction limit, namely:
    φ = 2.44 λ N (1) where N is the opening number of the imaging optics (N = D / F, with D pupil diameter of the imaging optics and F is the focal) and λ is the wavelength. For example, in the case of a spectral imaging device with an aperture number N = 3 and for a wavelength λ = 4.1 pm, the diameter of the focusing spot is of the order of 30 pm .
    Furthermore, the depth of focus, or depth of image field, essentially depends on the number of apertures of the optics used and the wavelength. It can be defined as the interval measured in the image space, in which the array of detectors must be placed in order to obtain a clear image.
    For example, an estimate of the hearth depth Pf can be given by:
    P f = 2 Ν φ (2)
    Thus, for an opening number N = 3 and a focusing spot de = 30pm, a depth of focus Pf = 180 pm is obtained.
    In practice, according to the present description, the focusing spot may cover a set of at least two elementary detectors juxtaposed when the matrix 23 is formed of a line of elementary detectors and at least four elementary detectors juxtaposed when the matrix 23 is formed by several lines of elementary detectors. Since the imaging device according to the present description is intended to detect several wavelengths, it is possible to use the minimum wavelength λ ,,, ιη of detection for the estimation of the diameter φ of the diffraction spot and depth of focus.
    As illustrated in FIG. 2B, the matrix 24 of elementary metallo-dielectric guided mode resonance filters is arranged in front of the detection matrix 23 at a given distance d, for example less than the depth of focus, which makes it possible to avoid too great a divergence of the beams at the level of each elementary filter.
    Furthermore, the dimensions of the elementary filters are adapted so that each elementary focusing spot formed at each point of the image field covers at least two elementary filters, these two elementary filters being optimized for band pass transmission in spectral bands centered on two lengths different central wavelengths equal to two detection wavelengths. Thus, at each elementary focusing spot, elementary detectors receive filtered light fluxes in spectral bands centered around different detection wavelengths.
    As an example, there is shown in FIG. 2B a diagram of a two-dimensional matrix 24 of elementary filters 24i. In this example, we can define zones Zi formed by 4 elementary filters each optimized for detection in a spectral band centered on a different detection wavelength. In practice, a focal spot of the imaging optics formed at the level of the filter matrix 24 and calculated for example for the smallest of the detection wavelengths, may cover a circular area inscribed in the frame. Zi.
    In practice, the dimensions of an elementary filter can be substantially the same as those of an elementary detector, as illustrated in FIG. 2B. But it is also quite possible that an elementary filter is a little larger or a little smaller than an elementary detector.
    For example, an elementary filter can have dimensions such that it covers a group of two elementary detectors (case of a 1D detection strip) or a group of 4 elementary detectors (case of a 2D detection matrix) as long as the elementary filter matrix is located in the focal depth of the imaging optics and that at the level of an elementary focusing spot, there are at least two elementary filters suitable for transmission in spectral bands centered on two distinct detection wavelengths.
    In general, it is possible to define zones Zi formed from a larger number of elementary filters, the filters being identical or different, but each zone Zi comprising at least two elementary filters optimized for band pass transmission in spectral bands centered on two different central wavelengths, equal to two detection wavelengths. The elementary filters can be arranged according to an arrangement given in each zone Zi. The zones Zi can all be identical, as in the example of FIG. 2B. Advantageously, the focusing spot is small enough to be contained in an area Zi so that there is no "overflow" from one area to another. For example, the focusing spot is circular, inscribed in an area Zi.
    As previously specified, an elementary metallo-dielectric guided mode resonance filter (GMR) comprises a waveguide made of dielectric material and at least one metallic network structured according to a given pattern, repeated with a given period, for the coupling of an incident wave in the guided mode of the waveguide. Thus, even when the dimension of an elementary filter is substantially equal to that of an elementary detector, as illustrated in FIG. 2B, as the dimension of an elementary filter is multiple in practice of the dimension of a pattern of a metallic network, it could be a little larger or a little smaller than an elementary detector, with a deviation less than the detection wavelength.
    As shown in FIG. 2A, the elementary filters 24i receive convergent light beams Fo, Fi, the convergence of the beams at the edge of the field (beam Fi) being more important than that in the center of the field (beam Fo). One can define in particular an angle of edge of the oc field, defined as the angle of the most inclined radius intended to reach the matrix of elementary detectors with respect to the direction normal to said matrix of elementary detectors. It depends on the size of the array of elementary detectors, the number of apertures and the focal length of the imaging optics. More precisely, we can define the edge of the field of view oc by:
    a = arctan n t + D pix pix
    2F (3)
    Where n pix is the maximum number of detection pixels (according to a dimension), t px is the pixel pitch.
    For example, for a number of detection pixels on a line n P i x = 640, a pixel pitch t P ix = 15 pm, a diameter of the forming optics D = 25 mm, a focal distance F = 50 mm, we obtain a field edge angle oc = 19 °
    Thus, all or part of the elementary filters, and in particular the elementary filters positioned at the edge of the field, may have an angular acceptance greater than or equal to the angle of the field edge of the device.
    Different elementary metallo-dielectric guided mode resonance (GMR) elementary filters known from the prior art can be used for the implementation of a multispectral infrared imaging device according to the present description.
    The dimensioning of the GMR filters for the infrared spectral filtering in a multispectral imaging device according to the present description may include the following steps.
    Depending on the applications, the detection wavelengths Xdi are defined as well as the widths Δλί of the detection spectral bands at the detection wavelengths considered. For example, for the detection of a particular chemical species, it may be advantageous to search for a low detection spectral bandwidth (less than 0.5 μm) while for other applications, for example for evaluating the emissivity of a body, it may be interesting to search for a larger detection spectral bandwidth (greater than lpm).
    The characteristics of the detection matrix are also fixed according to the application: detection strip or 2-dimensional matrix, number of pixels (n P i x ) in each direction and size of a pixel (t P i x ) .
    The opto-geometrical characteristics of the device, in particular the number of apertures N and the focal distance F of the imaging optics are chosen according to the scene to be observed, the detector (spatial resolution) and the size. maximum required for the device.
    We define below how the elementary filters can be chosen and dimensioned, according to the detection wavelengths Xdi sought, the width Δλί of the spectral detection band at the detection wavelength considered and opto parameters -Geometric of the detection device. In particular, one or more types of filters (DMG, biatome, etc.) can be determined in the same elementary filter matrix, as will be described below.
    For each type of filter, we seek to determine the geometric parameters of the filter making it possible to achieve the optical characteristics sought for the filter which are the maximum transmission Tmax, the resonance wavelength λ Γ , the resonance width Δλ and l 'angular acceptance ΔΘ. In practice, the resonance wavelength λ Γ sought, corresponding to the center wavelength of the transmission spectral band for which the transmission Tmax is maximum, will be equal to a detection wavelength Xdi. The resonance width Δλ sought, corresponding to the width at mid-height of the spectral response of the filter in transmission, will be equal to the width Δλί of the spectral detection band and the angular acceptance ΔΘ sought may be defined as a function of l 'oc field edge angle of the device (see equation (3) above).
    With regard to the angular acceptance ΔΘ of the elementary filters, it may advantageously be chosen to be greater than the edge angle of the oc field for all the filters of the matrix or at least for a part of the filters located at the edge of field. If the angular acceptance ΔΘ is less than the edge of the oc field edge, the filter continues to operate but its efficiency decreases since the transmission at resonance Tmax decreases and the quality factor Qi = λ <ΐί / Δλί can be degraded .
    The determination of the parameters of the elementary filters, once a type of filter has been chosen, may include the following steps: (1) choice of the first parameters, (2) verification of the first parameters by digital simulation (simulation of the transmission as a function of the length and simulation of the transmission as a function of the angle of incidence) and (3) modification of the parameters as a function of the results of the simulation.
    For step (2) of verification of the first parameters by digital simulation, a simulation of the transmission of the convergent beam filter can be performed. It includes a decomposition of the incident convergent beam into plane waves of different angles of incidence, the simulation of the propagation of each elementary plane wave and a summation of the elementary plane waves after propagation. The applicants have shown, however, that a simulation of the transmission of the “plane wave” filter could be carried out, since the parameters obtained with a simplified digital simulation in plane waves were substantially similar to those obtained by means of a simulation of the transmission. in convergent beams, provided that the angle of incidence of the wave remains within the range of the angular tolerance of the filter.
    In all cases, different known methods may be used to simulate responses of elementary filters to incident electromagnetic waves. One can for example use a modal calculation method such as RCWA (for “Rigorous coupledwave analysis”), described for example in M.G. Moharam et al., JOSAA 12, 1068 (1995). One can also use finite element methods (“FEM” for “Finite Element Methods”) implemented for example in the COMSOL Multiphysics® software or finite differences (“FDTD” for Finite Difference Time Domain) implemented in the LUMERICAL software ®. The curves presented in the following description are calculated by a modal calculation method, and more particularly using the Reticolo calculation code for Matlab® (P. Hugonin and P. Lalanne, “Reticolo software for grating analysis”, Institut d 'Optique, Orsay, France (2005)), assuming plane waves and one-dimensional pattern (slits).
    As previously explained, an elementary metallo-dielectric guided mode resonance filter, optimized for band pass transmission in a spectral band centered on a given resonance wavelength λ Γ , comprises, within the meaning of the present description, a layer dielectric material (refractive index na and thickness ta) forming a single-mode waveguide at said wavelength, and at least one metallic diffractive grating (refractive index n m and thickness t m ), structured according to a given pattern repeated with a given period (p), less than said resonance wavelength. The diffraction grating is suitable for coupling an incident wave to the resonance wavelength in the guided mode. The pattern can include one or more openings of given dimensions, the openings being able to be two-dimensional (cross, circular openings for example) or mono-dimensional (slots). The openings are filled with a dielectric material which may be ambient air or another dielectric material such as for example the dielectric material forming the waveguide or that forming the substrate, depending on the different types of filters.
    Three examples of elementary metallo-dielectric guided mode resonance filter designs for producing a multispectral imaging device according to the present description are given below. These examples are not limiting, other geometries being possible for the production of elementary guided mode resonance filters. In each case, a similar method for defining the filter parameters can be applied.
    A first example is described by means of FIGS. 3 A - 3C.
    In FIG. 3A, only one pattern of an elementary filter 30 of dimension p is shown. In practice, the elementary filter comprises a repetition of the pattern thus represented to form a diffraction grating having a period p.
    The elementary filter 30 illustrated in FIG. 3 A is of the suspended DMG (dual metallic grating) type. It comprises a layer of dielectric material 31 forming a single-mode waveguide at the resonance wavelength λ Γ , and two metal diffractive gratings 32, 33, arranged on either side of the layer of dielectric material, the everything being suspended in a fluid such as air or in a vacuum. Each metal network is structured according to a given pattern repeated with a given period p, less than the wavelength resonance wavelength. More specifically, in the example of FIG. 3A, the first metal network 32 comprises a pattern with two slots 321, 322 of respective widths ai and a2 and the second metal network 33 comprises a pattern with two slots 331, 332 of respective widths ai and a2 identical to those of the slots of the pattern of the first network.
    In the example of FIG. 3A, the metal networks are said to be "bi-atoms" because they have two slots of different width per pattern. Such a type of elementary DMG filter, bi-atom, is described for example in E. Sakat et al. 2013. Note however that if these filters are interesting from the point of view of angular acceptance, it is quite possible also to design a multispectral imaging device using elementary suspended DMG filters "mono-atom", that is, in which a pattern of a metallic diffractive grating comprises only one slit, as described for example in C. Tardieu et al., Optics Letters 40, 4 (2015).
    In step (1) of determining the first parameters, the thickness and the refractive index t g and n g of the waveguide are first chosen. t g and n g are chosen low enough for the waveguide to be single-mode at the desired resonance wavelength λ Γ . They thus respect the condition:
    <1 (4)
    We then set the period p and the dielectric index n g so that a plane wave under normal incidence at the resonant wavelength is diffracted in only 3 orders in the waveguide and only in order 0 in free space (incident medium or transmission medium). For this, we rely on the known laws of transmission networks.
    We can then adjust the width of the slots, knowing that we are looking in this case for two slots of different widths (ai f a2). Wide slots allow a strong transmission to resonance but reduce the quality factor. To obtain a finer resonance, you need narrower slits.
    In practice, the applicants have shown that at the interest detection wavelengths (for example between 3 pm and 5 pm), the parameters of the filters can be chosen in the following ranges of values:
    Metallic networks 32.33 in gold (Au), silver (Ag), or copper (Cu) t m between λ Γ / 100 and λ Γ / 10
    P <λ Γ ;
    ai <λ Γ / 4, a2 <λ Γ / 4, ai f a2;
    Dielectric material, for example made of silicon carbide (SiC) or silicon nitride (SiN) ta between λ Γ / 20 and λ Γ / 2;
    For a spectral range at the longest wavelengths, for example on the 8-12 pm range, the typical dimensions will naturally be larger.
    In step (2), we verify by numerical simulations the optical characteristics of each filter with the first parameters chosen.
    For this, the transmission spectrum of this filter is calculated in order to obtain the maximum transmission over the simulated wavelength range and its position in wavelength (FIG. 3B), corresponding respectively to the value of the transmission. at the resonance Tmax of the filter and at the resonance wavelength λ Γ . The half-width Δλ of the resonance is also obtained. The evolution of the transmission for the fixed wavelength λ Γ is also calculated (FIG. 3B) when the angle of incidence of the plane wave is modified. We deduce the angular tolerance of the filter ΔΘ which corresponds to the angle for which the transmission drops to half its value under normal incidence.
    The curves illustrated in FIGS. 3 A and 3B thus illustrate the transmission as a function of the wavelength and the transmission as a function of the angle of incidence for a guided mode resonance filter such as that described in FIG. 3 A with the following parameters:
    period p = 3 pm, ai = 0.2 pm, a2 = 0.7 pm, t m = 0.1 pm and ta = 0.65 pm, na = 2.15 (SiNx) and n m is given by a Drude model of gold.
    The simulations give for this filter: λ Γ = 4.01 pm, Tmax = 75%, ΔΘ = 17 ° and Δλ = 120 nm.
    The filter design step (3) includes a possible modification of the parameters for optimization depending on the characteristics sought. A lower resonance wavelength can be obtained, for example, by reducing the period p. Greater angular tolerance can be obtained by increasing the guide index. A finer spectral resonance can be obtained by reducing the width of the two slits. However, each time you modify a parameter to change the value of one of the optical characteristics, you have to readjust the other parameters, otherwise you risk degrading another of the optical characteristics. It is also possible to use an optimization algorithm to find the best parameters, such as particle swarm optimization (Mehrdad Shokooh-Saremiand et al., Particle swarm optimization and its application to the design of diffraction grating filters, Opt. Lett. 32, 894-896 (2007)).
    A second example is described by means of FIGS. 4A - 4C.
    In FIG. 4A as in FIG. 3A, only one pattern of an elementary filter 40 of dimension p is shown. In practice, the elementary filter comprises a repetition of the pattern thus represented to form a diffraction grating having a period p.
    The elementary filter 40 illustrated in FIG. 4A is of the DMG (dual metallic grating) bi-atom type, with substrate. It comprises a layer of dielectric material 41 (thickness ta, refractive index na) forming a single-mode waveguide at the resonance wavelength λ Γ , and two metal diffractive gratings 42, 43 (thicknesses t m i, tmi , refractive indices n m i, nnu), arranged on either side of the layer of dielectric material. It further comprises a substrate 44 of refractive index n su b (n su b <na) on which are deposited in this example the layer of dielectric material 41 and the metallic diffractive grating 42. Each metallic grating is structured according to a pattern given, the pattern being repeated for each network with a given period p less than the resonance wavelength. More specifically, in the example of FIG. 4A, the first metal network 32 comprises a pattern with two slots 421, 422 of respective widths bi and b2 and the second metal network 43 comprises a pattern with two slots 431, 432 of respective widths a'i and a'2.
    In practice, one can start from a suspended DMG filter as described in FIG. 3 A for a first estimate of the parameters in order to obtain the desired characteristics. We then choose a suitable substrate and adjust the widths of the network slots in contact with the substrate. We are looking for a substrate with the lowest possible optical index and a waveguide with a high optical index in order to maintain a single-mode waveguide. The period p is chosen so that there is only the order 0 diffracted by the networks which propagates in the substrate, as for the suspended guide. In this example, unlike the example in FIG. 3A, the widths and / or thicknesses of the slits of the network 42 are different from those of the network 43 to compensate for the change in index of the substrate. Such a filter is described for example in C. Tuambilangana et al., Optics Express 23, 25 (2015).
    As before, although two-atom metallic networks are presented in the example of FIG. 4A, it would also be possible to optimize the parameters for single-atom DMG filters on substrate.
    The curves illustrated in FIGS. 4A and 4B (step 2) illustrate the transmission as a function of the wavelength and the transmission as a function of the angle of incidence for a guided mode resonance filter such as that described in FIG. 4A with the following parameters: period p = 2 pm, ai = 0.12 pm, a2 = 0.62 pm, bi = 0.15 pm, b2 = 0.65 pm, t m i = 0.1 pm, tm2 = 0.05 pm, ta = 0.6 pm, n g = 2.84 (SiC) and n m is given by a Drude model of gold.
    The simulations give for this filter: λ Γ = 3.98 pm, Tmax = 92%, ΔΘ = 20 ° and Δλ = 160 nm.
    A step (3) of modifying the parameters to optimize the parameters as a function of the characteristics sought can be carried out as previously described.
    A second example is described by means of FIGS. 5A - 5C.
    In FIG. 5A as in FIG. 3A, only one pattern of an elementary filter 50 of dimension p is shown. In practice, the elementary filter comprises a repetition of the pattern thus represented to form a diffraction grating having a period p.
    Fe elementary filter 50 illustrated in FIG. 5A is of the single metallization type on the front face, with substrate. It comprises a layer of dielectric material 51 (thickness ta, refractive index na) forming a single-mode waveguide at the resonance wavelength λ Γ , and two metal diffractive gratings 52, 33 (thickness t m i and tm2 , refractive index n m ), this time arranged on the same side of the layer of dielectric material. It further comprises a substrate 54 of refractive index n su b (n su b <n g ) on which is deposited the layer of dielectric material 51 (substrate on the side opposite to the side carrying the networks). Each metal network is structured according to a given pattern, repeated for each network with a given period p, less than the resonance wavelength. More specifically, in the example of FIG. 5 A, the first metal network 52 comprises a pattern with two slots 521 of identical widths b'i and the second metal network 53 comprises a pattern with a single slot 531 of width a ”i.
    In practice, one can also start from a suspended DMG filter as described in FIG. 3A for a first estimate of the parameters in order to obtain the desired characteristics (but in a single atom configuration). We then choose a suitable substrate and adjust the width and thickness of the single slot of each network to change the quality factor and the angular tolerance.
    The curves illustrated in FIGS. 5A and 5B (step 2) illustrate the transmission as a function of the wavelength and the transmission as a function of the angle of incidence for a guided mode resonance filter such as that described in FIG. 5A with the following parameters: period p = 1.5 pm, a ”i = 0.2 pm, b'i = 0.1 pm, t m i = 0.1 pm, tm2 = 0.13 pm, ta = 0.63 pm, na = 2.15 (SiNx) and n m is given by a gold Drude model.
    The simulations give for this filter: X r = 3.89 pm, Tmax = 70%, ΔΘ = 15 ° and ΔΧ = 320 nm.
    A step (3) of modifying the parameters to optimize the parameters as a function of the characteristics sought can be carried out as previously described.
    The applicants have demonstrated that the metallo-dielectric GMR filters described above can operate in a convergent beam, and on surfaces the size of the detection pixel.
    FIG. 6A thus illustrates a sectional view of a matrix 24 of elementary guided mode resonance filters comprising in this example elementary filters 24a, 24b, each adapted for resonant transmission in a spectral band centered on the wavelengths Xa, Xb respectively. In this example, a matrix 24 is assumed to be formed of a line of elementary filters and suitable for filtering in a multispectral infrared imaging device equipped with an array of elementary detectors. However, it could just as easily be a 2D matrix of elementary filters suitable for filtering in an infrared multispectral imaging device equipped with a 2D matrix of elementary detectors. Each filter comprises a diffraction grating formed from a few periods of a pattern so that the dimensions of a filter are substantially the same as the dimensions of a pixel.
    The behavior of the filters under focused beam Fo is studied, the light beam Fo comprising a whole range of wavelengths, including the wavelengths Xa, Xb. The applicants have shown that the spread of the electric and magnetic fields in the waveguide at resonance is limited, the electromagnetic field being located at the wavelength Xa in the filter 24a and at the wavelength Xb in the filter 24b. Thus at the output of the filter matrix, beams F a and Fb are obtained respectively at the central wavelengths Xa and Xb.
    FIG. 6B thus shows the results of a digital simulation calculating the intensity of the magnetic field within an elementary filter, the simulation being carried out with a matrix of elementary filters as shown in FIG. 6A. For this simulation, each filter 24a, 24b is chosen of the suspended dual-atom DMG type, as illustrated for example in FIG. 3A, optimized respectively at resonant wavelengths Xa = 4 pm and Xb = 4.7 pm. Box 30 in FIG. 6A illustrates in detail a filter 24a, limited to a pattern. The characteristics of the filters are as follows. For the filter 24a, period pa = 3 pm, number of periods = 5, widths of the slots aiA = 0.2 pm, a2A = 0.5 pm. For the filter 24b, period pa = 3.7 pm, number of periods = 4, widths of the slits am = 0.1 pm, a2B = 0.7 pm. For the two filters 24a, 24b, the simulation is carried out with a layer of dielectric material formed in SiN and a metallic network in Au. In addition, tmA = tmB = 0.1 pm and tdA = tdB = 0.65 pm.
    For the simulation, the filters are illuminated with a focused Fo beam with a 9 ° half-opening angle and at the wavelength Xb. It can be seen that although these are guided mode resonance filters, the electromagnetic field is well located in filter B and that it alone transmits the incident radiation.
    A matrix of elementary metallo-dielectric guided mode resonance filters suitable for a multispectral imaging device according to the present description can be manufactured according to the known methods described for example in the articles referenced in the present description. The matrix can be deposited on a substrate or suspended.
    The arrangement of the elementary filter matrix near the elementary detector matrix can then be done in different ways. The matrix of elementary filters can for example be arranged without bonding with shims. It can also be glued, using a transparent glue in the range of filtering wavelengths. To prevent reflections at the interfaces at the substrate or glue level, an anti-reflective layer can be added if necessary. Gluing can be done in several ways. For example by inverting the filter and gluing the upper part with the networks to the detector array. Or, according to another example, in the case of a filter on a substrate whose typical thickness, greater than 300 μm, is generally greater than the depth of focus, the substrate can be thinned via mechanical polishing or chemical etching. and sticking the substrate to the detector array.
    Although described through a certain number of detailed exemplary embodiments, the device and the infrared multispectral imaging method according to the present description include different variants, modifications and improvements which will be obvious to those skilled in the art, it being understood that these different variants, modifications and improvements form part of the scope of the invention, as defined by the claims which follow.
    权利要求:
    Claims (10)
    [1" id="c-fr-0001]
    1. Device (20) for multispectral infrared imaging suitable for detection at at least a first and a second detection wavelength comprising:
    - a detection matrix (23) comprising a set of elementary detectors (23i) of predetermined dimensions forming an image field of given dimensions;
    an optic (22) for forming an image having a given number of aperture (N) and a focal distance (F), suitable for the formation at any point of the image field of an elementary focusing spot, said spot of focusing covering a set of at least two juxtaposed elementary detectors;
    - a matrix (24) of elementary metallodielectric guided mode resonance filters (24i), arranged in front of the detection matrix (23) at a distance less than a focal depth of the imaging optics, the dimensions of the elementary filters being adapted so that each elementary focusing spot formed at each point of the image field covers at least two elementary filters, said elementary filters being optimized for band pass transmission in spectral bands centered on two different central wavelengths , equal to two of said detection wavelengths.
    [2" id="c-fr-0002]
    2. A multispectral infrared imaging device according to claim 1, in which at least one of said elementary filters has an angular acceptance measured in plane waves greater than or equal to the field edge angle of the device, where the angle edge of field is defined as the angle of the most inclined radius intended to reach the matrix of elementary detectors compared to the direction normal to said matrix of elementary detectors.
    [3" id="c-fr-0003]
    3. Multispectral infrared imaging device according to any one of the preceding claims, in which each of said elementary filters has dimensions substantially identical to those of an elementary detector.
    [4" id="c-fr-0004]
    4. A multispectral infrared imaging device according to any one of the preceding claims, in which said elementary filters (24i) of the matrix (24) of elementary filters are arranged in the form of zones (Zi), each zone comprising at least two elementary filters optimized for band pass transmission in spectral bands centered on two different central wavelengths, and having dimensions greater than those of the focusing spot.
    [5" id="c-fr-0005]
    5. Multispectral infrared imaging device according to any one of the preceding claims, in which the matrix (24) of elementary filters comprises at least one elementary DMG type guided mode resonance filter, comprising a guide wave in dielectric material and two metal gratings on either side of the waveguide in dielectric material.
    [6" id="c-fr-0006]
    6. A multispectral infrared imaging device according to claim 5, in which the elementary DMG type guided mode resonance filter is suspended and the two metallic networks are identical.
    [7" id="c-fr-0007]
    7. A multispectral infrared imaging device according to claim 5, in which the elementary DMG type guided mode resonance filter is deposited on a substrate made of dielectric material and the two metal gratings of the elementary filter are different.
    [8" id="c-fr-0008]
    8. Device for multispectral infrared imaging according to any one of the preceding claims, in which the elementary filter matrix comprises at least one elementary mode guided resonance filter with single metallization on the front face, comprising a guide wave of dielectric material deposited on a substrate and, on the face opposite to the substrate, a double metallic network.
    [9" id="c-fr-0009]
    9. Multispectral infrared imaging device according to any one of the preceding claims, in which the matrix (24) of elementary filters comprises at least one elementary resonance mode guided filter of “bi atom” type, in which said at least one metal network has a pattern with at least two openings of different dimensions.
    [10" id="c-fr-0010]
    10. A multispectral infrared imaging method suitable for detection at at least a first and a second detection wavelength comprising:
    forming an image of a scene by means of a given aperture imaging optic (N) and acquiring said image by means of a detection matrix comprising a set of elementary detectors of predetermined dimensions forming an image field of given dimensions, the imaging optics (22) forming at every point of the image field an elementary focusing spot covering a set of at least two juxtaposed elementary detectors;
    5 - the filtering of light beams focused by said image forming optic by means of a matrix (24) of elementary metallo-dielectric guided mode resonance filters, arranged in front of the detection matrix (23) at a lower distance at a focal depth of the imaging optic so that each elementary focusing spot formed in
    10 each point of the image field covers at least two elementary filters, said elementary filters being optimized for band pass transmission in spectral bands centered on two different central wavelengths, equal to two of said detection wavelengths.
    1/7
    PRIOR ART
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    引用文献:
    公开号 | 申请日 | 公开日 | 申请人 | 专利标题
    US20040108564A1|2002-12-05|2004-06-10|Lockheed Martin Corporation|Multi-spectral infrared super-pixel photodetector and imager|
    US7807951B1|2004-03-01|2010-10-05|Raytheon Company|Imaging sensor system with staggered arrangement of imaging detector subelements, and method for locating a position of a feature in a scene|
    WO2009106316A2|2008-02-29|2009-09-03|Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V.|Multi-spectral sensor|
    EP2616855A1|2010-09-17|2013-07-24|Office National D'etudes Et De Recherches Aérospatiales |Spectral band-pass filter having high selectivity and controlled polarization|
    US20130277560A1|2012-04-18|2013-10-24|Ian Stuart Robinson|Infrared spectrometer with enhanced readout speed|
    US3971065A|1975-03-05|1976-07-20|Eastman Kodak Company|Color imaging array|
    US9258495B2|2012-06-21|2016-02-09|Providence Photonics, Llc|Multi-spectral infrared imaging system for flare combustion efficiency monitoring|
    TWI599757B|2012-12-19|2017-09-21|巴斯夫歐洲公司|Detector for detecting at least one object, use thereof, method for detecting at least one object, human-machine interface, entertainment device, tracking system and camera|
    FR3007148B1|2013-06-17|2016-11-25|Centre Nat De La Rech Scient - Cnrs|ANGULAR OPTICAL FILTERING ELEMENT FOR ANGULAR FILTERING WITH CONTROLLED ANGULAR SELECTIVITY|
    US10795174B1|2016-10-13|2020-10-06|Robert Magnusson|Flat-top narrow bandpass filters based on cascaded resonant gratings|EP3844659A4|2018-09-12|2021-10-27|Siemens Industry Software Inc.|Internal channel network detections for 3d printing|
    RU2713716C1|2019-06-11|2020-02-06|Закрытое акционерное общество "МНИТИ" |Method of generating signals of different-spectral television images|
    CN111323122A|2020-03-11|2020-06-23|中国科学院国家空间科学中心|Satellite-borne multi-channel aurora spectral imaging device|
    CN112558293A|2020-11-26|2021-03-26|中国科学院上海微系统与信息技术研究所|Compact common-path confocal infrared dual-waveband optical system and manufacturing method thereof|
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    2018-10-12| PLSC| Publication of the preliminary search report|Effective date: 20181012 |
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    优先权:
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